The etching properties of Al2O3 thin films in N 2/Cl2/BCl3 and Ar/Cl2/BCl 3 gas chemistry

Materials Science and Engineering: B

Volumn 118, Issue 1-3, 2005, Pages 201-204

  Koo, Seong Mo ^a   Kim, Dong Pyo ^a   Kim, Kyoung Tae ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

Al2O3; Etching; OES

Indexed keywords

ALUMINUM COMPOUNDS; ARGON; BORON COMPOUNDS; CHLORINE COMPOUNDS; ETCHING; INDUCTIVELY COUPLED PLASMA; LIGHT EMITTING DIODES; NITROGEN;

AL2O3; ETCH RATE; GAS-MIXING; OES;

THIN FILMS;

EID: 15344350860     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.12.029     Document Type: Conference Paper

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