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Volumn 118, Issue 1-3, 2005, Pages 117-121

Effects of deposition temperature on the microstructural and electrical properties of praseodymium oxide-based films

(6) Nigro, Raffaella Lo a Toro, Roberta G b Malandrino, Graziella b Fiorenza, Patrick b Raineri, Vito a Fragalà, Ignazio L b

a CNR (Italy)

b UNIVERSITY OF CATANIA (Italy)

Author keywords

Dielectric; High k; MOCVD; Praseodymium oxide

Indexed keywords

CAPACITANCE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DIELECTRIC MATERIALS; LEAKAGE CURRENTS; MICROSTRUCTURE; MOLECULAR BEAM EPITAXY; POLYCRYSTALLINE MATERIALS; PRASEODYMIUM COMPOUNDS; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM DEPOSITION; HIGH K; PRASEODYMIUM OXIDES; TEMPERATURE DEPOSITION;

THIN FILMS;

EID: 15344342154 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2004.12.022 Document Type: Conference Paper

Times cited : (15)

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