Reaction mechanism of a lanthanum precursor in liquid source metalorganic chemical vapor deposition

Materials Science and Engineering: B

Volumn 118, Issue 1-3, 2005, Pages 253-258

  Nakamura, Toshihiro ^a   Nishimura, Takuro ^a   Tai, Ryusuke ^a   Tachibana, Kunihide ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Infrared absorption spectroscopy; Lanthanum

Indexed keywords

ABSORPTION; CONCENTRATION (PROCESS); INFRARED SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MOLECULAR STRUCTURE; PROBLEM SOLVING;

DEPOSITION CHEMISTRY; INFRARED ABSORPTION SPECTROSCOPY; LANTHANUM PRECURSOR; OXIDE FILMS;

LANTHANUM;

EID: 15344341335     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.12.038     Document Type: Conference Paper

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