Thermal annealing of junctions with amorphous and polycrystalline ferromagnetic electrodes

Journal of Applied Physics

Volumn 96, Issue 11, 2004, Pages 6382-6386

  Dimopoulos, T ^a   Gieres, G ^a   Wecker, J ^a   Wiese, N ^a,b   Sacher, M D ^b  

^a SIEMENS AG   (Germany)

^b BIELEFELD UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; AMORPHOUS ALLOYS; ELECTRODES; FERROMAGNETIC MATERIALS; MAGNETORESISTANCE; POLYCRYSTALLINE MATERIALS; RAPID THERMAL ANNEALING;

FERROMAGNETIC ELECTRODES; ROOM TEMPERATURE; SPIN POLARIZATION; TUNNEL BARRIERS;

TUNNEL JUNCTIONS;

EID: 14944360341     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1808899     Document Type: Article

References (17)

1. J. S. Moodera, L. R. Kinder, T. M. Wong, and R. Meservey, Phys. Rev. Lett. 74, 3273 (1995).
2. A. Käufler, Y. Luo, K. Samwer, G. Gieres, M. Vieth, and J. Wecker, J. Appl. Phys. 91, 1701 (2002).
3. H. Kano, K. Bessho, Y. Higo, K. Ohba, M. Hashimoto, T. Mizuguchi, and M. Hosomi, Intennag Europe 2002 Digest of Technical Papers, Proceedings of the 2002 IEEE International Magnetic Conference, Amsterdam, Netherlands, 28 April-2 May 2002 (IEEE, Piscataway, NJ, 2002), p. BB04.
4. D. Wang, C. Nordman, J. Daughton, Z. Qian, and J. Fink, IEEE Trans. Magn. 40, 2269 (2004).
5. K. Tsunekawa, Y. Nagamine, H. Maehara, D. D. Djayaprawira, M. Nagai, and N. Watanabe, Digest of Technical Papers, Proceedings of the Ninth Joint Magnetism and Magnetic Materials/Intermag Conference, Anaheim, CA, 5-9 January 2004 (p. BD03).
6. L. Néel, C. R. Acad. Sci. URSS, Ser. A 122, 521 (1963).
7. Ferromagnetic Materials, edited by E. P. Wohlfarth (North-Holland Publishing Company, Amsterdam, 1980), Vol. 1, Chap. 6.
8. Y. Luo, M. Esseling, A. Käufler, K. Samwer, T. Dimopoulos, G. Gieres, M. Vieth, M. Rührig, J. Wecker, C. Rudolf, and M. Seibt (unpublished).
9. M. Jimbo, K. Komiyama, Y. Shirota, Y. Fujiwara, S. Tsunashima, and M. Matsuura, J. Magn. Magn. Mater. 165, 308 (1997).
10. T. Feng and J. R. Childress, J. Appl. Phys. 85, 4937 (1999).
11. A. Käufler, Y. Luo, and K. Samwer, J. Mater. Sci. 39, 3941 (2004).
12. S. Cardoso, P. P. Freitas, C. de Jesus, P. Wei, and J. C. Scares, Appl. Phys. Lett. 76, 610 (2000).
13. C.-S. Yoo et al., IEEE Trans. Magn. 38, 2715 (2002).
14. H. D. Jeong, J. H. Lee, C. S. Yoon, C. K. Kim, and J. H. Yuh, Appl. Surf. Sci. 199, 6 (2002).
15. W. F. Brinkman, R. C. Dynes, and J. M. Rowell, J. Appl. Phys. 41, 1915 (1970).
16. B. Oliver and J. Nowak, J. Appl. Phys. 95, 546 (2004).
17. P. LeClair, J. T. Kohlhepp, C. H. van de Vin, H. Wieldraaijer, H. J. M. Swagten, W. J. M. de Jonge, A. H. Davis, J. M. MacLaren, J. S. Moodera, and R. Jansen, Phys. Rev. Lett. 88, 107201 (2002).