Mechanical properties of poly-methyl methacrylate (PMMA) for nano imprint lithography

Journal of Photopolymer Science and Technology

Volumn 16, Issue 4, 2003, Pages 615-620

  Hirai, Yoshihiko ^a   Yoshikawa, Takashi ^a   Takagi, Nobuyuki ^a   Yoshida, Satoshi ^a   Yamamoto, Kazuhiro ^b  

^a Osaka Prefecture University   (Japan)

^b OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

Author keywords

Imprint lithography; Modulus; Molecular weight; Poly methyl methacrylate; Retardation time; Strain rate; Viscosity

Indexed keywords

POLY(METHYL METHACRYLATE);

ARTICLE; HYPOBARISM; MOLECULAR WEIGHT; PROCESS DESIGN; REACTION TIME; SCANNING ELECTRON MICROSCOPY; SHEAR STRESS; STRESS STRAIN RELATIONSHIP; TECHNOLOGY; VISCOELASTICITY;

EID: 0038168380     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.615     Document Type: Article

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