Influences of the deposition parameters and aging time on the residual stress of SiO2 films

Guangxue Xuebao/Acta Optica Sinica

Volumn 25, Issue 1, 2005, Pages 126-130

  Shao, Shuying ^a   Tian, Guanglei ^a   Fan, Zhengxiu ^a   Shao, Jianda ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Aging; Deposition temperature; Oxygen partial pressure; Residual stress; SiO2 films; Thin film optics

Indexed keywords

AGING OF MATERIALS; DEPOSITION; INTERFEROMETRY; REFRACTIVE INDEX; RESIDUAL STRESSES; SILICA;

DEPOSITION TEMPERATURE; ELECTRON BEAM EVAPORATION; OXYGEN PARTIAL PRESSURE; SILICA FILMS; THIN FILM OPTICS;

THIN FILMS;

EID: 14844334972     PISSN: 02532239     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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