Residual stress analysis of SiO2 films deposited by plasma-enhanced chemical vapor deposition

Surface and Coatings Technology

Volumn 131, Issue 1-3, 2000, Pages 153-157

  Choi, Jin Kyung ^a   Lee, J ^a   Yoo, Ji Beom ^a   Maeng, Jong Sun ^b   Kim, Young Man ^b  

^a Sungkyunkwan University   (South Korea)

^b Chonnam National University   (South Korea)

Author keywords

Hexamethyldisilazane; Plasma enhanced chemical vapor deposition; Residual stress of SiO2

Indexed keywords

FILM;

EID: 0034535297     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00753-2     Document Type: Conference Paper

References (9)