Study of residual stress in ZrO2 thin films

Guangxue Xuebao/Acta Optica Sinica

Volumn 24, Issue 4, 2004, Pages 437-441

  Shao, Shuying ^a   Fan, Zhengxiu ^a   Fan, Ruiying ^a   Shao, Jianda ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Deposition rate; Deposition temperature; Residual stress; Thin film physics; ZrO2 films

Indexed keywords

COMPRESSIVE STRESS; DEPOSITION; EVAPORATION; MICROSTRUCTURE; PHYSICS; RESIDUAL STRESSES; X RAY DIFFRACTION; ZIRCONIA;

DEPOSITION TEMPERATURE; ELECTRON BEAM EVAPORATION; THIN FILM PHYSICS;

THIN FILMS;

EID: 3042537944     PISSN: 02532239     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

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