Submicron-scale patterns on ferromagnetic-antiferromagnetic Fe/NiO layers by focused ion beam (FIB) milling

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 230, Issue 1-4, 2005, Pages 512-517

  Gazzadi, G C ^a   Luches, P ^a   Contri, S F ^b   Di Bona, A ^a   Valeri, S ^b  

^a CNR Consiglio Nazionale delle Ricerche   (Italy)

^b UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

Author keywords

Ferromagnetic antiferromagnetic layers; Focused ion beam (FIB); Ion beam lithography; Surface swelling

Indexed keywords

ANTIFERROELECTRIC MATERIALS; ATOMIC FORCE MICROSCOPY; EPITAXIAL GROWTH; FERROMAGNETIC MATERIALS; HIGH RESOLUTION ELECTRON MICROSCOPY; ION BEAM LITHOGRAPHY; ION BEAMS; IRON; NICKEL COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SWELLING; X RAY PHOTOELECTRON SPECTROSCOPY;

BEAM CURRENTS; FERROMAGNETIC/ANTIFERROMAGNETIC LAYERS; FOCUSED ION BEAMS (FIB); SURFACE SWELLING;

MULTILAYERS;

EID: 14844289545     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.12.093     Document Type: Conference Paper

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