High resolution magnetic patterning using focused ion beam irradiation

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 191-194

  Vieu, C ^a   Gierak, J ^a   Launois, H ^a   Aign, T ^b   Meyer, P ^b   Jamet, J P ^b   Ferre J ^b   Chappert, C ^c   Mathet, V ^c   Bernas, H ^c  

^a CNRS   (France)

^b UNIVERSITÉ PARIS SUD   (France)

^c UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; COERCIVE FORCE; HELIUM NEON LASERS; IRRADIATION; MAGNETIC PROPERTIES; MAGNETIZATION; NANOTECHNOLOGY; PARAMAGNETISM; PHOTOLITHOGRAPHY; PLUTONIUM; SPUTTERING; TEMPERATURE;

COLLISIONAL MIXING PROCESS; CURIE TEMPERATURE; FOCUSED ION BEAM; HIGH RESOLUTION MAGNETIC PATTERNING;

ION IMPLANTATION;

EID: 0034205420     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00294-X     Document Type: Article

References (6)

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