Analytical and finite element method design of quartz tuning fork resonators and experimental test of samples manufactured using photolithography 2: Comprehensive analysis of resonance frequencies using Sezawa's approximations

Vacuum

Volumn 78, Issue 1, 2005, Pages 91-105

  Lee, Sungkyu ^a   Moon, Yangho ^b   Lee, Jaekyu ^c   Yoon, Jeongho ^b   Moon, Ji Hoon ^a   Kim, Jong Hee ^d   Yoo, Seung Hyun ^a   Chung, Hyungsik ^a  

^a Ajou University   (South Korea)

^b Samsung Electro Mechanics   (South Korea)

^c Korea Institute of Science and Technology   (South Korea)

^d Korea Institute of Ceramic Engineering and Technology (KICET)   (South Korea)

Author keywords

Analytical method; Crystal impedance; Finite element method; Oblique evaporation; Photolithography; Photoresist spray coating method; Quartz; Resonance frequency; Series resistance; Sezawa's theory; Surface mount device; Tuning fork

Indexed keywords

APPROXIMATION THEORY; CODE DIVISION MULTIPLE ACCESS; EVAPORATION; FINITE ELEMENT METHOD; GLOBAL SYSTEM FOR MOBILE COMMUNICATIONS; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; PHOTORESISTORS; RESONANCE; RESONATORS; SURFACE MOUNT TECHNOLOGY; TUNING;

ANALYTICAL METHODS; CRYSTAL IMPEDANCE; OBLIQUE EVAPORATION; PHOTORESIST SPRAY COATING METHODS; SERIES RESISTANCE; SEZAWA'S THEORY; TUNING FORK;

QUARTZ;

EID: 14644431016     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.12.018     Document Type: Article

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