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Surface and Coatings Technology

Volumn 188-189, Issue 1-3 SPEC.ISS., 2004, Pages 255-259

Atmospheric pressure MOCVD of TiO2 thin films using various reactive gas mixtures

(3) Duminica, F D a Maury, Francis a Senocq, F a

a CNRS (France)

Author keywords

Gas mixture; MOCVD; TTIP

Indexed keywords

METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; STAINLESS STEEL; TITANIUM COMPOUNDS; TITANIUM DIOXIDE;

BI-PHASED COATINGS; OXIDE THIN FILMS; STAINLESS STEEL SUBSTRATES; TITANIUM TETRAISOPROPOXIDE (TTIP);

THIN FILMS;

GAS-GAS MIXING;

EID: 14644423965 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.08.038 Document Type: Article

Times cited : (53)

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