Observation of columnar microstructure in step-graded Si1-xGex/Si films using high-resolution X-ray microdiffraction

Physical Review Letters

Volumn 88, Issue 15, 2002, Pages 1561011-1561014

  Eastman, D E ^a   Stagarescu, C B ^a   Xu, G ^a   Mooney, P M ^b   Jordan Sweet, J L ^b   Lai, B ^c   Cai, Z ^c  

^a UNIVERSITY OF CHICAGO   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CHARGE COUPLED DEVICES; INTERFACES (MATERIALS); MICROSTRUCTURE; MOLECULAR ORIENTATION; MORPHOLOGY; PHOTONS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; X RAY DIFFRACTION ANALYSIS;

COLUMNAR MICROSTRUCTURE;

SEMICONDUCTING FILMS;

EID: 0037091288     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)