Evaluation of lattice strain in silicon substrate beneath aluminum conductor film using high-resolution x-ray microbeam diffractometry

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 10, 2002, Pages 6094-6097

  Yokoyama, Kazushi ^a   Kurihara, Hideaki ^a   Takeda, Shingo ^a   Urakawa, Masafumi ^a   Watanabe, Kyoko ^a   Katou, Madomi ^a   Inoue, Naoyuki ^a   Miyamoto, Naoki ^b,c   Tsusaka, Yoshiyuki ^a   Kagoshima, Yasushi ^a   Matsui, Junji ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b Hyogo 678 1205   (Japan)

^c Forensic Science Laboratory   (Japan)

Author keywords

Aluminum conductor; High resolution x ray diffractometry; Lattice strain; Reciprocal space; Rocking curve; Synchrotron radiation; X ray microbeam

Indexed keywords

ALUMINUM; CONDUCTIVE FILMS; DEPOSITION; ELECTRON ENERGY LEVELS; PHOTONS; SILICA; STRAIN MEASUREMENT; SYNCHROTRON RADIATION; X RAY DIFFRACTION ANALYSIS;

ALUMINUM CONDUCTOR FILM; HIGH RESOLUTION X RAY MICROBEAM DIFFRACTOMETRY; LATTICE STRAIN; STRAIN DISTRIBUTION; X RAY MICROBEAM;

SEMICONDUCTING SILICON;

EID: 0036818450     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.6094     Document Type: Article

References (16)

1. Semiconductor Silicon, eds. R. R. Haberecht and E. L. Kern (Electrochem. Soc., New York, 1969).
2. P.-C. Wang, G. S. Cargill III, I. C. Noyàn and C.-K. Hu: Appl. Phys. Lett. 72 (1998) 1296.
3. H. H. Solak, G. F. Lorusso, S. Singh-Gasson and F. Cerrina: Appl. Phys. Lett. 74 (1999) 22.
4. P.-C. Wang, I. C. Noyàn, S. K. Kaldor, J. L. Jordan-Sweet, E. G. Liniger and C.-K. Hu: Appl. Phys. Lett. 76 (2000) 3726.
5. X. Zhang, H. Solak, F. Cerrina, B. Lai, Z. Cai, P. Ilinski, D. Legnini and W. Rodrigues: Appl. Phys. Lett. 76 (2000) 315.
6. P.-C. Wang, I. C. Noyàn, S. K. Kaldor, J. L. Jordan-Sweet, E. G. Liniger and C.-K. Hu. Appl. Phys. Lett. 78 (2001) 2712.
7. N. Yamamoto: Rev. Sci. Instrum. 67 (1996) 3051.
8. Y. Tsusaka, K. Yokoyama, S. Takeda, K. Takai, Y. Kagoshima and J. Matsui: Nucl. Instrum. Methods A 467-468 (2001) 670.
9. Y. Tsusaka, K. Yokoyama, S. Takeda, M. Urakawa, Y. Kagoshima, J. Matsui, S. Kimura, H. Kimura, K. Kobayashi and K. Izumi: Jpn. J. Appl. Phys. 39 (2000) L635.
10. S. Takeda, K. Yokoyama, M. Urakawa, T. Ibuki, K. Takai, Y. Tsusaka, Y. Kagoshima, J. Matsui and N. Miyamoto: Nucl. Instrum. Methods A 467-468 (2001) 974.
11. K. Yokohama, S. Takeda, M. Urakawa, Y. Tsusaka, Y. Kagoshima, J. Matsui, S. Kimura, H. Kimura, K. Kobayashi, T. Ohhira, K. Izumi and N. Miyamoto: Nucl. Instrum. Methods A 467-468 (2001) 1205.
12. T. Tanaka and H. Kitamura: Nucl. Instrum. Methods A 364 (1995) 368.
13. A. Iida and K. Kohra: Phys. Status Solidi A 51 (1979) 533.
14. D. K. Bowen and B. K. Tanner: High Resolution X-Ray Diffractometry and Topography (Taylor and Francis, London, 1998) p. 149.
15. I. A. Blech and E. S. Meieran: J. Appl. Phys. 38 (1967) 2913.
16. S. Isomae: J. Appl. Phys. 52 (1981) 2782.