Microcrystalline silicon solar cells fabricated by VHF plasma CVD method

Solar Energy Materials and Solar Cells

Volumn 86, Issue 4, 2005, Pages 565-575

  Saito, Keishi ^a   Sano, Masafumi ^a   Okabe, Shotaro ^a   Sugiyama, Shuichiro ^a   Ogawa, Kyousuke ^a  

^a CANON INC   (Japan)

Author keywords

High deposition rate; Microcrystalline silicon; Solar cell; Three stacked junction; VHF plasma

Indexed keywords

CATHODES; CRYSTALLINE MATERIALS; DEPOSITION; DIFFUSION; FABRICATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

HIGH DEPOSITION RATE; MICROCRYSTALLINE SILICON; THREE-STACKED JUNCTIONS; VHF PLASMA;

SILICON SOLAR CELLS;

EID: 13944270274     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2004.09.006     Document Type: Article

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