Control of crystallinity and orientation of microcrystalline silicon using in situ rheed observation

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn 2000-January, Issue , 2000, Pages 780-783

  Kitagawa, Toshihisa ^a   Kondo, Michio ^a   Matsuda, Akihisa ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

NUCLEATION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;

COLUMNAR GROWTH; IN- SITU MONITORING; MODERATE TEMPERATURE; NUCLEATION DENSITIES; PREFERENTIAL GROWTH; PREFERENTIAL ORIENTATION; SOLAR CELL PERFORMANCE; TWO-STEP GROWTH METHODS;

MICROCRYSTALLINE SILICON;

EID: 84949550697     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2000.915999     Document Type: Conference Paper

References (6)

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5. T. Kitagawa, M. Kondo and A. Matsuda, J. of Noncry. Sol. 266, 64 (2000)
6. H. Keppner, J. Meier, P. Torres, D. Fischer and A. Shah, Appl. Phys. A, 69, 169 (1999)