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Volumn 26, Issue 1-4, 2005, Pages 236-240
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Formation of InAs quantum dots and wetting layers in GaAs and AlAs analyzed by cross-sectional scanning tunneling microscopy
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Author keywords
Molecular beam epitaxy; Quantum dots; Relaxation; Semiconducting III V materials; Strain; X STM
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Indexed keywords
ELASTICITY;
FINITE ELEMENT METHOD;
LATTICE CONSTANTS;
MOLECULAR BEAM EPITAXY;
SCANNING TUNNELING MICROSCOPY;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING INDIUM COMPOUNDS;
SEMICONDUCTOR GROWTH;
STRAIN;
THREE DIMENSIONAL;
CROSS-SECTIONAL SCANNING TUNNELING MICROSCOPY (X-STM);
SEMICONDUCTING III-V MATERIALS;
WETTING LAYERS;
SEMICONDUCTOR QUANTUM DOTS;
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EID: 13444252641
PISSN: 13869477
EISSN: None
Source Type: Journal
DOI: 10.1016/j.physe.2004.08.104 Document Type: Conference Paper |
Times cited : (26)
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References (14)
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