Low temperature deposition of TiO2 films with high refractive indices by oxygen-radical beam-assisted evaporation combined with ion beam

Vacuum

Volumn 66, Issue 3-4, 2002, Pages 347-352

  Yamada, Yasumi ^a   Uyama, Haruo ^a   Murata, Takanori ^b   Nozoye, Hisakazu ^c  

^a TOPPAN PRINTING CO LTD   (Japan)

^b Shincron Co Ltd   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Evaporation; Ion beam; Radical beam; Refractive index; Titanium oxide

Indexed keywords

DEPOSITION; EVAPORATION; ION BEAMS; IRRADIATION; LOW TEMPERATURE EFFECTS; REFRACTIVE INDEX; TITANIUM DIOXIDE;

RADICAL BEAMS;

THIN FILMS;

EID: 0037136147     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00142-2     Document Type: Article

References (14)