Optical emission spectroscopy on pulsed-DC plasmas used for TiN depositions

Surface and Coatings Technology

Volumn 102, Issue 1-2, 1998, Pages 41-49

  Mogensen, K S ^a   Eskildsen, S S ^b   Mathiasen, C ^b   Bottiger J ^a  

^a AARHUS UNIVERSITY   (Denmark)

^b DANISH TECHNOLOGICAL INSTITUTE   (Denmark)

Author keywords

OES; PACVD; Pulsed DC; TiN

Indexed keywords

ARGON; CERAMIC COATINGS; CHEMICAL VAPOR DEPOSITION; ELECTRIC CURRENT MEASUREMENT; EMISSION SPECTROSCOPY; HYDROGEN; LIGHT EMISSION; NITROGEN; PLASMA APPLICATIONS; PRESSURE EFFECTS; REACTION KINETICS; TOOL STEEL;

OPTICAL EMISSION SPECTROSCOPY (OES); PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION (PACVD); TITANIUM TETRACHLORIDE;

TITANIUM NITRIDE;

EID: 0032049227     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00529-X     Document Type: Article

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