High resolution electron beam lithography using a chemically amplified calix[4]arene based resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3485-3488

  Sailer, H ^a   Ruderisch, A ^a   Henschel, W ^a   Schurig, V ^a   Kern, D P ^a  

^a UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE; CATIONIC POLYMERIZATION; ELECTRON BEAMS; ORGANIC SOLVENTS; POLYMETHYL METHACRYLATES; RESINS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SURFACE ROUGHNESS; THICK FILMS;

CALIXARENE; CHEMICAL AMPLIFICATION (CA); ELECTRON BEAM RESISTS; LIQUID CARBON DIOXIDE;

ELECTRON BEAM LITHOGRAPHY;

EID: 13244278357     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1809618     Document Type: Conference Paper

References (18)

1. C. D. Gutsehe, Calixarenes, Royal Society of Chemistry, Cambridge, 1989.
2. J. Fujita, Y. Onishi, Y. Ochiai, and S. Matsui, Appl. Phys. Lett. 68, 1297 (1996).
3. Y. Onishi, J. Fujita, Y. Ochiai, and S. Matsui, Microelectron. Eng. 35, 117 (1997).
4. S. Yasin, D. G. Hasko, and H. Ahmed, J. Vac. Sci. Technol. B 19, 311 (2001).
5. H. Sailer, A. Ruderisch, D. P. Kern, and V. Schurig, J. Vac. Sci. Technol. B 20, 2958 (2002).
6. A. Ruderisch, H. Sailer, V. Schurig, and D. P. Kern, Microelectron. Eng. 67-08, 292 (2003).
7. H. Namatsu, V. Takahashi, K. Yamazaki, T. Yamaguchi, M. Nagase, and K. Kurihara, J. Vac. Sci. Technol. B 16, 69 (1998).
8. R. Leuschner and G. Pawlowski, Photolithography, Materials Science and Technology Vol. 16 (Wiley, New York, 1997).
9. P. Argitis, S. Boyatzis, I. Raptis, N. Glezos, and M. Hatzakis, ACS Symp. Ser. 706, 345 (1998).
10. M. Hatzakis, J. Shaw, E. Babich, and J. Paraszczak, J. Vac. Sci. Technol. B 6, 2224 (1988).
11. M. Hatzakis, K. J. Stewart, J. M. Shaw, and S. A. Rishton, J. Electrochem. Soc. 138, 1076 (1991).
12. P. Argitis, I. Raptis, C. J. Aidinis, N. Glezos, M. Baciocchi, J. Everett, and M. Hatzakis, J. Vac. Sci. Technol. B 13, 3030 (1995).
13. H. Sailer, A. Ruderisch, D. P. Kern, and V. Schurig, Microelectron. Eng. 73-74, 228 (2004).
14. K. Y. Lee, N. LaBianca, S. A. Rishton, S. Zoghamain, J. D. Gelorme, J. Shaw, and T. H.-P. Chang, J. Vac. Sci. Technol. B 13, 3012 (1995).
15. H. Lorenz, M. Despont, N. Fahrni, N. Labianca, P. Renaud, and P. Vettiger, J. Micromech. Microeng. 7, 121 (1997).
16. W. H. Wong and E. Y. B. Pun, J. Vac, Sci. Technol. B 19, 732 (2001).
17. M. Aktary, M. O. Jensen, K. L. Westra, M. J. Brett, and M. R. Freeman, J. Vac. Sci. Technol. B 21, L5 (2003).
18. T. Takata, H. Takagi, and Y. Furusho, Enantiomer 7, 129 (2002).