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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3513-3517

Evaluation of outgassing from a fluorinated resist for 157 nm lithography

(9) Irie, Shigeo a Hagiwara, Takuya a Fujii, Kiyoshi a Itakura, Yasuo b Kawasa, Youichi b Egawa, Keiji b Uchino, Ikuo b Sumitani, Akira b Itani, Toshiro c

a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

b KOMATSU LTD (Japan)

c RENESAS TECHNOLOGY CORP (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; DEGASSING; GAS CHROMATOGRAPHY; LASER BEAM EFFECTS; LITHOGRAPHY; SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

GAS CHROMATOGRAPH MASS SPECTROMETER (GC-MS); METHOXYMETHYL (MOM); TERT-BUTOXYCARBONYL (T-BOC); TETRAFLUOROETHYLENE (TFE);

FLUORINE CONTAINING POLYMERS;

EID: 13244267378 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1821580 Document Type: Conference Paper

Times cited : (4)

References (11)

1
- 0036030252
- M. Toriumi, N. Shida, H. Watanabe, T. Yamazaki, S. Ishikawa, and T. Itani, Proc. SPIE 4690, 191 (2002).
- (2002) Proc. SPIE , vol.4690 , pp. 191
- Toriumi, M.¹ Shida, N.² Watanabe, H.³ Yamazaki, T.⁴ Ishikawa, S.⁵ Itani, T.⁶

2
- 0037786847
- S. Kodama, I. Kaneko, Y. Takebe, S. Okada, Y. Kawaguchi, N. Shida, S. Ishikawa, M. Toriumi, and T. Itani, Proc. SPIE 4690, 10 (2002).
- (2002) Proc. SPIE , vol.4690 , pp. 10
- Kodama, S.¹ Kaneko, I.² Takebe, Y.³ Okada, S.⁴ Kawaguchi, Y.⁵ Shida, N.⁶ Ishikawa, S.⁷ Toriumi, M.⁸ Itani, T.⁹

3
- 0036029388
- N. Shida, H. Watanabe, T. Yamazaki, S. Ishikawa, M. Toriumi, and T. Itani, Proc. SPIE 4690, 497 (2002).
- (2002) Proc. SPIE , vol.4690 , pp. 497
- Shida, N.¹ Watanabe, H.² Yamazaki, T.³ Ishikawa, S.⁴ Toriumi, M.⁵ Itani, T.⁶

4
- 0032662161
- F. M. Houlihan, I. L. Rushkin, R. S. Hutton, A. G. Timko, O. Nalamasu, and E. Reichmanis, Proc. SPIE 3678, 264 (1999).
- (1999) Proc. SPIE , vol.3678 , pp. 264
- Houlihan, F.M.¹ Rushkin, I.L.² Hutton, R.S.³ Timko, A.G.⁴ Nalamasu, O.⁵ Reichmanis, E.⁶

5
- 3843088850
- R. R. Kunz and D. K. Downs, J. Vac. Sci. Technol. B 17, 6 (1999).
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 6
- Kunz, R.R.¹ Downs, D.K.²

6
- 0035759012
- T. M. Bloomstein, V. Liberman, S. T. Palmacci, and M. Rothschild, Proc. SPIE 4346, 685 (2001).
- (2001) Proc. SPIE , vol.4346 , pp. 685
- Bloomstein, T.M.¹ Liberman, V.² Palmacci, S.T.³ Rothschild, M.⁴

7
- 0036411725
- T. M. Bloomstein, V. Liberman, M. Rothschild, S. T. Palmacci, D. E Hardy, and J. H. C. Sedlacek, Proc. SPIE 4691, 709 (2002).
- (2002) Proc. SPIE , vol.4691 , pp. 709
- Bloomstein, T.M.¹ Liberman, V.² Rothschild, M.³ Palmacci, S.T.⁴ Hardy, D.E.⁵ Sedlacek, J.H.C.⁶

8
- 0141834837
- M. Shirai, T. Shinozuka, and M. Tsunooka, Proc. SPIE 5039, 113 (2003).
- (2003) Proc. SPIE , vol.5039 , pp. 113
- Shirai, M.¹ Shinozuka, T.² Tsunooka, M.³

9
- 0141611809
- Y. Matsui, S. Umeda, S. Matsui, S. Seki, and S. Tagawa, Proc. SPIE 5039, 121 (2003).
- (2003) Proc. SPIE , vol.5039 , pp. 121
- Matsui, Y.¹ Umeda, S.² Matsui, S.³ Seki, S.⁴ Tagawa, S.⁵

10
- 0036410436
- A. Sumitani, Y. Itakura, F. Yoshida, Y. Kawasa, J. Zhang, N. Kanda, and T. Itani, Proc. SPIE 4691, 1686 (2002).
- (2002) Proc. SPIE , vol.4691 , pp. 1686
- Sumitani, A.¹ Itakura, Y.² Yoshida, F.³ Kawasa, Y.⁴ Zhang, J.⁵ Kanda, N.⁶ Itani, T.⁷

11
- 0141834718
- Y. Itakura, Y. Kawasa, A. Sumitani, S. Ishikawa, S. Irie, and T. Itani, Proc. SPIE 5039, 524 (2003).
- (2003) Proc. SPIE , vol.5039 , pp. 524
- Itakura, Y.¹ Kawasa, Y.² Sumitani, A.³ Ishikawa, S.⁴ Irie, S.⁵ Itani, T.⁶

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