Study of resist outgassing as a function of differing photoadditives

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 264-274

  Houlihan, F M ^a   Rushkin, I L ^a   Hutton, R S ^a   Timko, A G ^a   Nalamasu, O ^a   Reichmanis, E ^a   Gabor, A H ^a   Medina, A N ^a   Malik, S ^a   Neiser, M ^a   Kunz, R R ^a   Downs, D K ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; DEGASSING; ELECTRON BEAMS; MOLECULAR STRUCTURE; RESINS;

PHOTOACID GENERATORS; PHOTOADDITIVES; RESIST OUTGASSING;

PHOTORESISTS;

EID: 0032662161     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (10)