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Volumn 5039 I, Issue , 2003, Pages 121-128
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Dependence of outgassing characters and total amount of outgassed species at 157 nm exposure on the structures of resist base polymer
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Author keywords
[No Author keywords available]
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Indexed keywords
COPOLYMERS;
DEGASSING;
ESTERS;
FLUORINE;
FLUORINE CONTAINING POLYMERS;
HYDROGEN;
MASS SPECTROMETERS;
PRESSURE;
STRUCTURE (COMPOSITION);
TEMPERATURE;
QUADRUPOLE MASS SPECTROMETER;
SIDE-CHAIN-FLUORINATED POLYMERS;
TERT-BUTYL FLUOROACRYLATE;
TETRAFLUOROETHYLENE;
VACUUM CHAMBER;
PHOTORESISTS;
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EID: 0141611809
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.485200 Document Type: Conference Paper |
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Times cited : (11)
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References (7)
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