In-situ measurements of VUV optical materials for F2 laser

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 1686-1695

  Sumitani, Akira ^a   Itakura, Yasuo ^a   Yoshida, Fumika ^a   Kawasa, Youichi ^a   Zhang, Jing ^a   Kanda, Noriyoshi ^b   Itani, Toshiro ^b  

^a KOMATSU LTD   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; FLUORINE; MATERIALS SCIENCE; OPTICAL COATINGS; SUBSTRATES; ULTRAVIOLET RADIATION;

LASER COATINGS;

PHOTOLITHOGRAPHY;

EID: 0036410436     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474557     Document Type: Article

References (8)

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2. V. Liberman, M. Rothschild, N.N. Efremow, S.T. Palmacci and J.H.C. Sedlacek, "Marathon evaluation of optical materials for 157-nm lithography," Proc. SPIE, 4346, pp.45-51, 2001.
3. T.M. Bloomstein, V. Liberman, S.T. Palmacci and M. Rothschild, "Controlled Contamination of optics under 157-nm laser irradiation," Proc. SPIE, 4346, pp.685-694, 2001.
4. S. Nagai, T. Enami, T. Nishisaka, J. Fujimoto, O. Wakabayashi and H. Mizoguchi, "Development of kHz F2 laser for 157nm lithography," Proc. Microprocesses and Nanotechnology '99, pp.64-65, 1999.
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7. 2 Laser for Dioptric Projection System," (this volume).
8. Y. Itakura, F. Yoshida, Y. Kawasa, A. Sumitani, O. Wakabayashi and H. Mizoguchi, "Evaluation of characteristics of VUV optical materials irradiated by F2 laser," Proc. SPIE, 4346, pp. 1088-11094, 2001.