-
1
-
-
0031103563
-
Surface-micromachined micro-XYZ stages for free-space microoptical bench
-
L. Y. Lin, J. L. Shen, S. S. Lee, and M. C. Wu, "Surface-Micromachined Micro-XYZ Stages for Free-Space Microoptical Bench", IEEE Photon. Technol. Lett., vol. 9, pp345-347, 1997.
-
(1997)
IEEE Photon. Technol. Lett.
, vol.9
, pp. 345-347
-
-
Lin, L.Y.1
Shen, J.L.2
Lee, S.S.3
Wu, M.C.4
-
2
-
-
0036244161
-
Optomechanical model of surface micromachined tunable optoelectronic devices
-
Chien-Chung Lin, Wayne A. Martin, and James S. Harris, Jr., "Optomechanical Model of Surface Micromachined Tunable Optoelectronic Devices", IEEE J. Select. Topics Quantum Electron., vol. 8, pp80-87, 2002.
-
(2002)
IEEE J. Select. Topics Quantum Electron.
, vol.8
, pp. 80-87
-
-
Lin, C.-C.1
Martin, W.A.2
Harris Jr., J.S.3
-
3
-
-
0020089536
-
SiN membrane masks for x-ray lithography
-
K. Suzuki, J. Matsui, and T. Torikai, "SiN membrane masks for x-ray lithography", J. Vac. Sci. Technol., vol. 20, pp191-194, 1982.
-
(1982)
J. Vac. Sci. Technol.
, vol.20
, pp. 191-194
-
-
Suzuki, K.1
Matsui, J.2
Torikai, T.3
-
4
-
-
0037531275
-
Nitrogen-rich silicon nitride thin films for deep-ultraviolet Mirau interferometry
-
F. C. Chang and G. S. Kino, "Nitrogen-rich silicon nitride thin films for deep-ultraviolet Mirau interferometry", Opt. Lett., vol. 22, pp492-494, 1997.
-
(1997)
Opt. Lett.
, vol.22
, pp. 492-494
-
-
Chang, F.C.1
Kino, G.S.2
-
5
-
-
0010123339
-
Stress relaxation in Si-rich silicon nitride thin films
-
H. Habermehl, "Stress relaxation in Si-rich silicon nitride thin films ", J. Appl. Phys., Vol.83, pp4672-4677, 1988.
-
(1988)
J. Appl. Phys.
, vol.83
, pp. 4672-4677
-
-
Habermehl, H.1
-
6
-
-
0032329865
-
Residual stress in low pressure chemical vapor deposition SiNx films deposited from silane and ammonia
-
P. Temple-Boyer, C. Rossi, E. Saint-Etienne, and E. Scheid, "Residual stress in low pressure chemical vapor deposition SiNx films deposited from silane and ammonia", J. Vac. Sci. Technol A, vol. 16, pp2003-2007, 1998.
-
(1998)
J. Vac. Sci. Technol A
, vol.16
, pp. 2003-2007
-
-
Temple-Boyer, P.1
Rossi, C.2
Saint-Etienne, E.3
Scheid, E.4
-
7
-
-
0345377483
-
Influence of deposition conditions on mechanical properties of low-pressure chemical vapor deposited low-stress silicon nitride films
-
Yvete Toivola, Jeremy Thurn, Robert F. Cook, Greg Cibuzar and Kevin Roberts, "Influence of deposition conditions on mechanical properties of low-pressure chemical vapor deposited low-stress silicon nitride films", J. Appl. Phys., Vol.94, pp6915-6922, 2003.
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 6915-6922
-
-
Toivola, Y.1
Thurn, J.2
Cook, R.F.3
Cibuzar, G.4
Roberts, K.5
-
8
-
-
0031345940
-
X-ray mask fabrication using new membrane process techniques
-
S. Uchiyama, M. Oda, T. Matsuda and S. Ohki, "X-Ray Mask Fabrication Using New Membrane Process Techniques", Jpn. J. Appl. Phys., vol. 36, pp7580-7585, 1997.
-
(1997)
Jpn. J. Appl. Phys.
, vol.36
, pp. 7580-7585
-
-
Uchiyama, S.1
Oda, M.2
Matsuda, T.3
Ohki, S.4
-
9
-
-
0035387332
-
Low-temperature PECVD-deposited silicon nitride thin films for sensor applications
-
G. Suchaneck, V. Norkus, and G. Gerlach, "Low-temperature PECVD-deposited silicon nitride thin films for sensor applications", Surface and Coatings Technology, vol. 142, pp808-812, 2001.
-
(2001)
Surface and Coatings Technology
, vol.142
, pp. 808-812
-
-
Suchaneck, G.1
Norkus, V.2
Gerlach, G.3
-
10
-
-
18544399582
-
Technology of reflective membranes for spatial light modulators
-
S. Sakarya, G. Vdodin, and P. M. Sarro, "Technology of reflective membranes for spatial light modulators", Sensors and Actuators A, vol. 97, pp468-472, 2002.
-
(2002)
Sensors and Actuators A
, vol.97
, pp. 468-472
-
-
Sakarya, S.1
Vdodin, G.2
Sarro, P.M.3
-
11
-
-
0030672719
-
Progress in low-temperature surface passivation of silicon solar cells using remote-plasma silicon nitride
-
Armin G. Aberle, and Rudolf Hezel, "Progress in Low-temperature Surface Passivation of Silicon Solar Cells using Remote-plasma Silicon Nitride", Progress in Photovoltaics: Research and Applications, vol. 5, pp29-50, 1997.
-
(1997)
Progress in Photovoltaics: Research and Applications
, vol.5
, pp. 29-50
-
-
Aberle, A.G.1
Hezel, R.2
-
13
-
-
36849104521
-
Calculated elastic constants for stress problems associated with semiconductor devices
-
W.A. Brantley, "Calculated elastic constants for stress problems associated with semiconductor devices", J. Appl. Phys., vol.44, pp534-535, 1973.
-
(1973)
J. Appl. Phys.
, vol.44
, pp. 534-535
-
-
Brantley, W.A.1
-
14
-
-
0001394585
-
Form-birefringent computer-generated holograms
-
F. Xu, R.C. Tyan, P. C. Sun, Y. Fainman, C. C. Cheng, and Alex Scherer, "Form-birefringent computer-generated holograms", Opt. Lett., vol. 21, pp1513-1515, 1996.
-
(1996)
Opt. Lett.
, vol.21
, pp. 1513-1515
-
-
Xu, F.1
Tyan, R.C.2
Sun, P.C.3
Fainman, Y.4
Cheng, C.C.5
Scherer, A.6
-
15
-
-
13244249318
-
Optical elements with ultrahigh spatial frequency surface corrugations
-
R. C. Enger and S. K. Case, "Optical elements with ultrahigh spatial frequency surface corrugations", Appl. Phys. Lett., Vol. 42, pp492-494, 1983.
-
(1983)
Appl. Phys. Lett.
, vol.42
, pp. 492-494
-
-
Enger, R.C.1
Case, S.K.2
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