Optical and electronic characterization of a-SiGe:H thin films prepared by a novel hollow cathode deposition technique

Materials Research Society Symposium Proceedings

Volumn 808, Issue , 2004, Pages 365-370

  Soukup, R J ^a   Ianno, N J ^a   Darveau, Scott A ^b   Exstrom, Christopher L ^b  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^b UNIVERSITY OF NEBRASKA AT KEARNEY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SECONDARY ION MASS SPECTROMETRY; SPECTROSCOPIC ANALYSIS; THIN FILMS;

BAND GAP; HIGH EFFICIENCY CELLS; SOLAR ILLUMINATION; STABLE FILMS;

AMORPHOUS SILICON;

EID: 12744259337     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-808-a9.4     Document Type: Conference Paper

References (24)

1. K. Zweibel, Solar Energy Mat. and Solar Cells 59, 1 (1999).
2. X. Deng, X.Liao, S.Han, H.Povolny, P.Agarwal, Solar Energy Mat. and Solar Cells 62, 89 (2000).
3. J. Yang, et. al. Proc. NREL/SNL PV Prog. Rev., Lakewood, CO, 1996, pp. 13-26.
4. E.C. Molenbroek, A.H.Mahan, E J Johnson and AC Gallagher, J. Appl. Phys. 79, 7278 (1996).
5. E.C. Molenbroek, A. H. Mahan, Alan Gallagher, J. Appl. Phys. 82, 1909 (1997).
6. NREL world wide web page, http://www.nrel.gov/ncpv/pvmenu.cgi?site=ncpv&idx= 1&body=world.html
7. W. Ruihua, et.al., Solar Energy Mat. and Solar Cells 62, 193 (2000).
8. B.P. Nelson, Y. Xu, D.L. Williamson, B. Von Roedern, A. Mason, S. Heck, A.H. Mahan, S.E. Schmitt, A.C. Gallagher, J. Webb, and R. Reedy, MRS Proc. 507 (1998) 447-452.
9. M. Sícha, L. Bárdos, M. Tichy, L. Soukup, L. Jastrabík, H. Baránková, R.J. Soukup and J. Tous, Contrib. Plasma Phys. 34, 749 (1994).
10. M. Tichy, M. Sícha, L. Bárdos, L. Soukup, L. Jastrabík, K. Kapoun, J. Tous, Z. Mazanec and R. J. Soukup, Contrib. Plasma Phys. 34, 765 (1994).
11. L. Soukup, V. Perina, L. Jastrabík, M. Sícha, P. Pokorny, R.J. Soukup, M. Novák, and J. Zemek, Surface and Coatings Technology 78, 280 (1996).
12. G. Pribil, Z. Hubička, R.J. Soukup, and N.J. Ianno, J. Vac. Sci. Technol. A. 19, 1571 (2001).
13. G. Pribil, R.J. Soukup, and N.J. Ianno, "Deposition of a-Ge:H Films by a Hollow Cathode Plasma-Jet Sputtering System," presented at the American Vacuum Symposium, Oct. 2001, San Francisco.
14. R. J. Soukup, N. J. Ianno, G.Pribil and Z. Hubička, Surface and Coatings Technol., 177-178, 676 (2004).
15. Z. Hubička, G. Pribil, R. J. Soukup, and N. J. Ianno, Surface and Coatings Technol. 160, 114 (2002).
16. A.A. Langford, M.L. Fleet, B.P. Nelson, W.A. Lanford, and N. Maley, Phys. Rev. B 45, 13367 (1992).
17. C.J. Fang, K.J. Gruntz, L. Ley, M. Cardona, F.J. Demond, G. Müller, and S. Kalbitzer, J. Non-Cryst. Solids 35 & 36, 255 (1980).
18. A.S. Ferlauto, G.M. Ferreira, J.M. Pearce, C.R. Wronski, R.W. Collins, X. Deng, and G. Ganguly, J. Appl. Phys. 92, 2424 (2002).
19. M.H. Brodsky, M. Cardona, and J.J. Cuomo, Phys. Rev. B 16, 3556 (1977).
20. K. Mui and F.W. Smith, Phys. Rev. B 38, 10623 (1988).
21. K. Mui and F.W. Smith, Phys. Rev. B 35, 8080 (1987).
22. H. Mahan, NREL, private communication.
23. M. Stutzmann, R.A. Street, C.C. Tsai, J.B. Boyce, and S.E. Ready, J. Appl. Phys. 66, 569 (1989).
24. M. Heintze, K. Eberhardt, O. Tress, and G.H. Bauer, J. Non-Cryst. Solids 137 & 138, 49 (1991).