Study of hot wire chemical vapor deposition technique for silicon thin film

Solar Energy Materials and Solar Cells

Volumn 62, Issue 1, 2000, Pages 193-199

  Ruihua, Wu ^a   Zhiqiang, Luo ^a   Li, Liu ^a   Jahe, Liu ^a  

^a GENERAL RESEARCH INSTITUTE FOR NONFERROUS METALS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ENERGY GAP; FILM PREPARATION; HIGH TEMPERATURE EFFECTS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; THIN FILMS;

HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD); MICROCRYSTALLINE MATERIALS; MULTICRYSTALLINE MATERIALS;

SEMICONDUCTING FILMS;

EID: 0003400065     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(99)00153-1     Document Type: Article

References (4)

1. A.H. Mahan, M. Vanecek, AIP Conferences Proceedings, 234, Denver, Colarado, 1991.
2. Mahan A.H.et al. J. Appl. Phys. 69(9):1991;6728.
3. Mahan A.H.et al. Mat. Res. Soc. Proc. 219:1991;673.
4. Ruihua W., Zhiqiang L. Chinese J. Rare Metals. 22(6):1998;453.