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Volumn 808, Issue , 2004, Pages 41-46
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Metastability in undoped microcrystalline silicon thin films deposited by HWCVD
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
ATOMIC FORCE MICROSCOPY;
CARRIER CONCENTRATION;
CHEMICAL VAPOR DEPOSITION;
CRYSTALLIZATION;
ELECTRIC CONDUCTIVITY;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
INFRARED SPECTROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SILICON WAFERS;
ATMOSPHERIC GASES;
METASTABILITY;
MICROCRYSTALLINE FILMS;
POST DEPOSITION OXIDIZATION;
THIN FILMS;
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EID: 12744258041
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-808-a9.10 Document Type: Conference Paper |
Times cited : (5)
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References (12)
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