Effect of reticle CD uniformity on wafer CD uniformity in the presence of scattering bar optical proximity correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3546, Issue , 1998, Pages 642-650

  Adam, Konstantinos ^a   Socha, Robert ^a   Dusa, Mircea ^a   Neureuther, Andrew ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR ANALYSIS; IMAGE ANALYSIS; IMAGE QUALITY; PHOTORESISTS;

CRITICAL DIMENSIONS (CD); MASK ERROR FACTOR (MEF); OPTICAL PROXIMITY CORRECTION (OPC);

MASKS;

EID: 0032293766     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.332862     Document Type: Conference Paper

References (7)