A modified DXRL process for fabricating a polymer microstructure

Journal of Micromechanics and Microengineering

Volumn 14, Issue 2, 2004, Pages 256-262

  Kim, Jin Tae ^a   Han, Sang Pil ^a   Jeong, Myung Yung ^b  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

^b Pusan National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DEEP X-RAY LITHOGRAPHY (DXRL); X RAY POWER SPECTRUM;

ASPECT RATIO; IRRADIATION; LITHOGRAPHY; MICROSTRUCTURE; POLYMETHYL METHACRYLATES; RADIATION DAMAGE; RELAXATION PROCESSES; X RAYS;

COMPOSITE MICROMECHANICS;

EID: 1242332743     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/14/2/013     Document Type: Article

References (19)

1. Ehrfeld W and Lehr H 1995 Deep X-ray lithography for the production of three-dimensional microstructures from metals, polymers and ceramics Radiat. Phys. Chem. 45 349-65
2. Guckel H 1998 High-aspect ratio micromachining via deep X-ray lithography Proc. IEEE 86 1586-93
3. Kupka R K, Bouamrane F, Cremers C and Megtert S 2000 Microfabrication: LIGA-X and applications Appl. Surf. Sci. 164 97-110
4. Henry A C, McCarley R L, Das S S and Khan Malek C G 1999 Characteristics of commercial PMMA sheets used in the fabrication of extreme high aspect ratio microstructures J. Electrochem. Soc. 146 2631-6
5. Choi J O, Moore J A, Corelli J C, Silverman J P and Bakhru H 1988 Degradation of poly(methylemthacrylate) by deep ultraviolet, X-ray, electron bean and proton beam irradiations J. Vac. Sci. Technol. B 6 2286-9
6. Tan M X, Bankert M A, Griffiths S K, Ting A, Boehme D R, Wilson S and Balser L M 1998 PMMA development studies using various synchrotron sources and exposure conditions SPIE 3512 262-70
7. Pantenburg F J and Mohr J 1995 Influence of secondary effects on the structure quality in deep X-ray lithography Nucl. Instrum. Methods B 97 551-6
8. El-Kholi A, Bade K, Mohr J, Pantenburg F J and Tang X M 2000 Alternative resist adhesion and electroplating layers for LIGA process Microsyst. Technol. 6 161-4
9. Perennes F and Pantenburg F J 2001 Adhesion improvement in the deep X-ray lithography process using a central beam-stop Nucl. Instrum. Methods B 174 317-23
10. Clough R L and Shaleby S W 1991 Radiation Effects on Polymers (Washington, DC: American Chemical Society)
11. Vladimirsky Y, Vladimirsky O, Morris K J, Klopf J M, Calderon G M and Saile V 1996 PMMA as an X-ray resist for micro-machining application: latent image formation and thickness losses Microelectron. Eng. 30 534-46
12. Mohr J, Ehrfeld W and Münchmeyer D 1988 Requirements on resist layer in deep-etch synchrotron radiation lithography J. Vac. Sci. Technol. B 6 2264-7
13. Henke B L, Gullikson E M and Davis J C 1993 X-ray interactions: photo-absorption scattering, transmission, and reflection at E = 50-300000 eV, z = 1-92 Atom. Data Nucl. Data 54 181-342
14. Lehockey E M and Reid I 1988 The radiation chemistry of poly(methyl methacrylate) polymer resists J. Vac. Sci. Technol A 6 2221-5
15. Miller K J, Hellman J H and Moore J A 1993 Conformation of poly(methyl methacrylate) and its degraded forms upon radiation Macromolecules 26 4945-52
16. Henry A C, McCarley R L, Das S, Malek C K and Poche D S 1998 Structural changes in PMMA under hard X-ray irradiation Microsyst. Technol. 4 104-9
17. Pantenburg F J, Achenbach S and Mohr J 1998 Characterisation of defects in very high deep-etch X-ray lithography microstructures Microsyst. Technol. 4 89-93
18. Achenbach S, Pantenburg F J and Mohr J 2003 Numerical simulation of thermal distortions in deep and ultra deep x-ray lithography Microsyst. Technol 9 220-4
19. Feiergag G, Whrfeld W, Lehr H, Schmidt A and Schmidt M 1997 Calculation and experimental determination of the structure transfer accuracy in deep X-ray lithography J. Micromech. Microeng. 7 323-31