Adhesion improvement in the deep X-ray lithography process using a central beam-stop

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 174, Issue 3, 2001, Pages 317-323

  Perennes F ^a   Pantenburg, F J ^b  

^a SINCROTRONE TRIESTE   (Italy)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; BANDPASS FILTERS; MASKS; MICROSTRUCTURE; PHOTONS; PHOTORESISTS; POLYMETHYL METHACRYLATES; SYNCHROTRON RADIATION; TITANIUM OXIDES;

DEEP X RAY LITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0343844420     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00588-7     Document Type: Article

References (8)

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