Film thickness degradation of Au/GaN Schottky contact characteristics

Materials Science and Engineering: B

Volumn 117, Issue 1, 2005, Pages 21-25

  Wang, K ^a   Wang, R X ^a   Fung, S ^a   Beling, C D ^a   Chen, X D ^a   Huang, Y ^a   Li, S ^a   Xu, S J ^a   Gong, M ^b  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

^b SICHUAN UNIVERSITY   (China)

Author keywords

Diffusion; GaN; Gold; Schottky barrier

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CRYSTAL LATTICES; CURRENT VOLTAGE CHARACTERISTICS; DIFFUSION; ELECTRIC BREAKDOWN; FILM GROWTH; GOLD; OHMIC CONTACTS; SEMICONDUCTING GALLIUM ARSENIDE; THICK FILMS; THICKNESS MEASUREMENT; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM THICKNESS; GAN; SCHOTTKY BARRIER; THERMIONIC EMISSION THEORY;

SCHOTTKY BARRIER DIODES;

EID: 12344307384     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2004.10.011     Document Type: Article

References (17)

1. Q.Z. Liu, and S.S. Lau Solid-State Electron. 42 1998 677
2. P. Hacke, T. Detchprohm, K. Hiramatsu, and N. Sawaki Appl. Phys. Lett. 63 1993 2676
3. L.D. Bell, and R.P. Smith Appl. Phys. Lett. 76 2000 1725
4. X.J. Wang, and L. He J. Electron. Mater. 27 1998 1272
5. Y. Kribes, I. Harrison, B. Tuck, T.S. Cheng, and C.T. Foxon Semicond. Sci. Technol. 12 1997 913
6. S.K. Noh, and P. Bhattacharya Appl. Phys. Lett. 78 2001 3642
7. C.I. Wu, and A. Kahn J. Appl. Phys. 89 2001 425
8. E.A. Preble, K.M. Tracy, S. Kiesel, H. McLean, P.Q. Miraglia, and R.J. Nemanich J. Appl. Phys. 91 2002 2133
9. N. Toyama J. Appl. Phys. 63 1987 2720
10. N. Toyama, T. Takahashi, H. Murakami, and H. Koriyama Appl. Phys. Lett. 46 1984 557
11. S.M. Sze, Physics of Semiconductor Devices, second ed., 245.
12. G.L. Chen, F.C. Chang, W.C. Chung, and B.R. Huang Jpn. J. Appl. Phys. 40 Pt.2 2001 255
13. E.H. Rhoderick, and R.H. Williams Metal-Semiconductor Contacts second ed. 1988 Oxford Science Publications 191
14. A. Hierro, M. Hansen, J.J. Boeckl, L. Zhao, J.S. Speck, U.K. Mishra, S.P. DenBaars, and S.A. Ringel Phys. Stat. Sol. (b) 228 2001 937
15. T.P. Chen, T.C. Lee, C.C. Ling, C.D. Beling, and S. Fung Solid-State Electron. 36 1993 949
16. E.H. Rhoderick, and R.H. Williams Metal-Semiconductor Contacts second ed. 1988 Oxford Science Publications 181
17. P. Kozodoy, J.P. Ibbetson, H. Marchand, P.T. Fini, S. Keller, J.S. Speck, S.P. DenBaars, and U.K. Mistra Appl. Phys. Lett. 73 1998 975