Fluoropolymers for 157 nm single-layer resists

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 1, 2004, Pages 27-30

  Toriumi, M ^a   Ishikawa, T ^a   Kodani, T ^a   Koh, M ^a   Moriya, T ^a   Yamashita, T ^a   Araki, T ^a   Aoyama, H ^a   Yamazaki, T ^b   Furukawa, T ^b   Itani, T ^b  

^a DAIKIN INDUSTRIES LTD   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALKALINITY; CARRIER CONCENTRATION; COPOLYMERS; DISSOLUTION; DRY ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROCARBONS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OPACITY; RESINS; SCANNING ELECTRON MICROSCOPY; SOLUBILITY; TRANSPARENCY; VACUUM APPLICATIONS;

FUNCTIONAL GROUPS; QUANTUM CHEMISTRY;

FLUORINE CONTAINING POLYMERS;

EID: 12144287469     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1633282     Document Type: Conference Paper

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