Correlation of inspection methods in characterizing nanomachined photomask repairs

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5446, Issue PART 1, 2004, Pages 375-383

  Csuy, Jeffrey ^a   Bozak, Ronald ^a   Terrill, Lee ^a   White, Roy ^a   Nishida, Naoki ^b  

^a RAVE LLC   (United States)

^b HOYA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CORRELATION METHODS; IMAGE PROCESSING; MACHINING; MASKS; NUMERICAL METHODS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS;

INSPECTION METHODS; MAINSTREAM PROCESS; NANOMACHINING; PHOTOMASKS;

NANOSTRUCTURED MATERIALS;

EID: 11844256411     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557736     Document Type: Conference Paper

References (16)

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