Subtractive defect repair via Nanomachining

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 670-673

  Laurance, M R ^a  

^a RAVE LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; CRYSTAL DEFECTS; MICROMACHINING; MOLYBDENUM COMPOUNDS; PHOTOLITHOGRAPHY; QUARTZ;

NANOMACHINING; SUBTRACTIVE DEFECT REPAIR;

MASKS;

EID: 0035047033     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.410683     Document Type: Conference Paper

References (0)