Defect repair performance using the nanomachining repair technique

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 520-527

  Morikawa, Yasutaka ^a   Kokubo, Haruo ^a   Nishiguchi, Masaharu ^a   Hayashi, Naoya ^a   White, Roy ^b   Bozak, Ron ^b   Terrill, Lee ^b  

^a DAI NIPPON PRINTING CO LTD   (Japan)

^b RAVE LLC   (United States)

Author keywords

Alternating Aperture Phase Sifting Mask; ArF lithography; Nanomachining; New repair technique

Indexed keywords

DEFECTS; ETCHING; IMAGING TECHNIQUES; MACHINING; PHASE SHIFT; PHOTOLITHOGRAPHY; QUARTZ; REPAIR;

ALTERNATING APERTURE PHASE SHIFTING MASKS (AAPSM); ARF LITHOGRAPHY; NANOMACHINING; NEW REPAIR TECHNIQUE;

MASKS;

EID: 1642555692     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504213     Document Type: Conference Paper

References (5)

1. B. LoBianco, et al, "Use of Nanomachining for 100nm Nanometer Mask Repair", BACUS2002, Proc. of SPIE Vol.4889, p909-921, 2002.
2. D. Brinkley, et al, "Use of Nanomachining for Subtractive Repair of EUV and Other Challenging Mask Defects", PMJ2002, Proc. of SPIE Vol. 4754, p900-911, 2002.
3. M. Verbeek, et al, "High precision mask repair using nanomachining", EMC2002.
4. R. White, et al, "Use of Nanomachining as a Technique to reduce Scrap of High End Photomasks", BACUS2001, Proc. of SPIE Vol.4562, p213-224, 2001.
5. M. Laurance, "Subtractive Defect repair via Nanomachining", BACUS2000, Proc. of SPIE Vol.4186, p670-673, 2000.