Investigation of nanomachining as a technique for geometry reconstruction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 232-240

  Brinkley, David ^a   Bozak, Ron ^b   Chiu, Bin ^b   Ly, Chanh ^a   Tolani, Vikram ^a   White, Roy ^b  

^a INTEL CORPORATION   (United States)

^b RAVE LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYOGENICS; ION BEAMS; MASKS; PHASE SHIFT; SEMICONDUCTOR MATERIALS;

NANOMACHINING;

NANOTECHNOLOGY;

EID: 0038303208     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.468275     Document Type: Article

References (3)

1. B. J. Lin, "The Attenuated Phase Shift Mask," Solid State Technol., pp. 43-47, January, 1992.
2. T. Terasawa, N. Hasegawa, H. Fukuda, and S. Katagiri, "Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase Shifting Masks," Jpn. J. App. Phys. Vol. 30, pp. 2991-2997, 1991.
3. P. Rai-Choudhury, Handbook of Microlithograpy, Micromachining, and Microfabrication: Vol 1 Microlithography, pg 74-82, SPIE and IEE, 1997.