Contact hole model for etch depth dependence

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 1, 1999, Pages 158-161

  Abraham Shrauner, Barbara ^a  

^a WASHINGTON UNIVERSITY IN ST LOUIS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013180689     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590529     Document Type: Article

References (10)

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