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Volumn 70, Issue 16, 2004, Pages 1-10

First-principles study of the origin of retarded diffusion of boron in silicon in the presence of germanium [46]

Author keywords

[No Author keywords available]

Indexed keywords

BORON; GERMANIUM; SILICON;

EID: 11344265753     PISSN: 01631829     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevB.70.165206     Document Type: Article
Times cited : (18)

References (43)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.