Quantitative evaluation of sputtering induced surface roughness in depth profiling of polycrystalline multilayers using Auger electron spectroscopy

Thin Solid Films

Volumn 444, Issue 1-2, 2003, Pages 120-124

  Wang, J Y ^a   Hofmann, S ^a   Zalar, A ^b   Mittemeijer, E J ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b Institute of Surface Engineering and Optoelectronics Ljubljana   (Slovenia)

Author keywords

AES depth profiling; Depth resolution; Ni Cr multilayer; Sputtering induced roughness

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; POLYCRYSTALLINE MATERIALS; SPUTTERING; SURFACE ROUGHNESS;

QUANTITATIVE EVALUATION;

MULTILAYERS;

EID: 0142106810     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01112-X     Document Type: Article

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