A reverse selectivity ceria slurry for the damascene gate chemical mechanical planarization process

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 11 A, 2004, Pages 7434-7438

  Kim, Sang Kyun ^a   Sohn, Hyung Min ^a   Paik, Ungyu ^a   Katoh, Takeo ^a   Park, Jea Gun ^a  

^a Hanyang University   (South Korea)

Author keywords

Chemical mechanical planarization; Damascene gate; Selectivity; Slurry; Stability

Indexed keywords

CERIUM COMPOUNDS; PARAMETER ESTIMATION; PH EFFECTS; PLASMAS; POLYMERS; ULSI CIRCUITS;

CHEMICAL MECHANICAL PLANARIZATION; DAMASCENE GATE; SELECTIVITY; SURFACE CHARGES;

CHEMICAL MECHANICAL POLISHING;

EID: 11144224485     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.7434     Document Type: Article

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