Real-time observation of initial stages of copper film growth on silicon oxide using reflection high-energy electron diffraction

Journal of Applied Physics

Volumn 96, Issue 12, 2004, Pages 7071-7079

  Drotar, Jason T ^a,b   Lu, T M ^a   Wang, G C ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b NAVAL SURFACE WARFARE CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON CONTAMINATION; FILM DEPOSITION; GRAIN ORIENTATION; REAL-TIME DEPOSITION;

COPPER; DEPOSITION; ELECTRON BEAMS; GRAIN BOUNDARIES; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICA; TEXTURES; THIN FILMS;

FILM GROWTH;

EID: 11044225589     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1811785     Document Type: Article

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