Effects of accelerated ion beam deposition to form thin metal films on silicon

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 121, Issue 1-4, 1997, Pages 162-165

  Iida, S ^a   Shindo, T ^a,b   Matsuura, S ^a   Ashimura, Y ^a  

^a OSAKA SANGYO UNIVERSITY   (Japan)

^b NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CRYSTALLIZATION; ION BEAMS; SILICON; SILVER; SUBSTRATES; THIN FILMS;

ION BEAM DEPOSITION;

DEPOSITION;

EID: 0031546176     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00441-7     Document Type: Article

References (12)

1. I. Yamada, Radiat. Eff. Def. Solids 124 (1992) 69.
2. I. Yamada and H. Takaoka, Jpn. J. Appl. Phys. 32 (1993) 2121.
3. S. Iida, T. Nakamura, Y. Ashimura and T. Shindo, Jpn. J. Appl. Phys. 34 (1995) 4920.
4. T. Yasue, C. Park and T. Koshikawa, Appl. Surf. Sci. 70/71 (1993) 428.
5. S. Watanabe, N. Nakayama and T. Ito, Appl. Phys. Lett. 59 (1991) 1458.
6. H. Onishi, I. Katayama, Y. Oba, F. Shoji and K. Oura, Jpn. J. Appl. Phys. 32 (1993) 2920.
7. St. Tosch and H. Neddermeyer, Phys. Rev. Lett. 61 (1988) 349.
8. K.L. Chopla, J. Appl. Phys. 37 (1977) 2249.
9. M.A. Hansen, S.A. Barnett, J.E. Sundgren and J.E. Greene, J. Vac. Sci. Technol. A 5 (1987) 1963.
10. I. Yamada, L.L. Levenson, H. Usui and T. Takagi, Mat. Res. Symp. Proc. 93 (1987) 253.
11. I. Yamada, D. Marton and F.W. Saris, Appl. Phys. Lett. 3716 (1980) 182.
12. W. Mönch, Phys. Low-Dim. Struct. 4/5 (1994) 1.