Residual stresses in (Zr,Hf)N films (up to 11.9 at.% Hf) measured by X-ray diffraction using experimentally calculated XECs

Surface and Coatings Technology

Volumn 191, Issue 2-3, 2005, Pages 188-194

  Atar, E ^a   Sarioglu, C ^b   Cimenoglu, H ^c   Kayali, E S ^c  

^a GEBZE TECHNICAL UNIVERSITY   (Turkey)

^b MARMARA UNIVERSITY   (Turkey)

^c ISTANBUL TECHNICAL UNIVERSITY   (Turkey)

Author keywords

Coatings; Residual stress; Thin film; X ray diffraction; ZrN and HfN

Indexed keywords

ANISOTROPY; COMPUTATIONAL METHODS; HAFNIUM COMPOUNDS; RESIDUAL STRESSES; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM COMPOUNDS;

FIXED INCIDENT MULTIPLANE TECHNIQUE (FIM); ISOTROPIC MODELS;

METALLIC FILMS;

COATING;

EID: 10944226462     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.02.024     Document Type: Article

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