Control of photocorrosion in the copper damascene process

Journal of the Electrochemical Society

Volumn 147, Issue 3, 2000, Pages 1193-1198

  Homma, Yoshio ^a   Kondo, Seiichi ^a   Sakuma, Noriyuki ^a   Hinode, Kenji ^b   Noguchi, Junji ^a   Ohashi, Naofumi ^a   Yamaguchi, Hizuru ^a   Owada, Nobuo ^a  

^a HITACHI LTD   (Japan)

^b Device Development Center ^*

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; DIFFUSION IN SOLIDS; ELECTROCHEMICAL ELECTRODES; INTEGRATED CIRCUIT MANUFACTURE; LIGHTING; POLISHING; ULSI CIRCUITS;

COPPER DAMASCENE PROCESS; COPPER INTERCONNECTIONS; PHOTOCORROSION;

CORROSION PREVENTION;

EID: 0033893412     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393335     Document Type: Article

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