Stabilization of alumina slurry for chemical-mechanical polishing of copper

Langmuir

Volumn 12, Issue 15, 1996, Pages 3563-3566

  Luo, Q ^a   Campbell, D R ^b   Babu, S V ^a,b  

^a Clarkson University   (United States)

^b CLARKSON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COLLOID CHEMISTRY; COPPER; FOURIER TRANSFORM INFRARED SPECTROSCOPY; POLISHING; POLYETHYLENE GLYCOLS; STABILITY;

BENZOTRIAZOLES; CHEMICAL MECHANICAL POLISHING; SLURRY STABILITY; ZETA POTENTIALS;

ALUMINA;

EID: 0030197845     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la960062w     Document Type: Article

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