Improvements in graphite-based X-ray mask fabrication for ultradeep X-ray lithography

Microsystem Technologies

Volumn 10, Issue 10, 2004, Pages 728-734

  Divan, R ^a   Mancini, D C ^a   Gallagher, S M ^b   Booske, J ^b   Van Der Weide, D ^c  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b University of Wisconsin Madison   (United States)

^c UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROPLATING; GRAPHITE; PHOTOLITHOGRAPHY; SILICA; SYNCHROTRON RADIATION; THERMAL EXPANSION; X RAY ANALYSIS;

GOLD ELECTROFORMING; LIGA TECHNIQUES; PROTOTYPE STRUCTURES; X-RAY MASKS;

MASKS;

EID: 10844252198     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-004-0445-9     Document Type: Conference Paper

References (17)

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