Aluminum chemical vapor deposition reaction of dimethylaluminum hydride on TiN studied by X-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry

Applied Surface Science

Volumn 171, Issue 1-2, 2001, Pages 71-81

  Tanaka, Kozo ^a   Yanashima, Hiroyuki ^a   Yako, Tadaaki ^b   Kamio, Kunimasa ^a   Sugai, Kazumi ^c   Kishida, Shunji ^c  

^a SUMITOMO CHEMICAL CO LTD   (Japan)

^b Sumika Chemical Analysis Service   (Japan)

^c NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ALUMINUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; HYDRIDES; MORPHOLOGY; NUCLEATION; OXIDATION; REDUCTION; SECONDARY ION MASS SPECTROMETRY; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

DIMETHYLALUMINUM HYDRIDE;

METALLIC FILMS;

EID: 0035253985     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00542-0     Document Type: Article

References (21)

1. Tsubouchi K., Masu K. J. Vac. Sci. Technol. A10:1992;856.
2. Kawamoto H., Sakaue H., Takehiro S., Horiike Y. Jpn. J. Appl. Phys. 29:1990;2657.
3. Naik M., Guo T., Chen L., Mosely R., Beinglass I. J. Vac. Sci. Technol. A16:1998;1233.
4. Zhu N., Cacouris T., Scarmozzino R., Osgood R.M. Jr. J. Vac. Sci. Technol. B10:1992;1167.
5. Kondoh E., Ohta T. J. Vac. Sci. Technol. A13:1995;2863.
6. Sugai K., Okabayashi H., Shinzawa T., Kishida S., Kobayashi A., Yako T., Kadokura H. J. Vac. Sci. Technol. B13:1995;2115.
7. Sugai K., Kishida S., Shinzawa T., Okabayashi H., Yako T., Kadokura H., Isemura M., Kobayashi T., Hosokawa N. J. Electrochem. Soc. 144:1997;1028.
8. D. Briggs, in: D. Briggs, M.P. Seah (Eds.), Practical Surface Analysis, 2nd Edition, Vol. 2, Wiley, Chichester, 1992, p. 367.
9. Hearn M.J., Briggs D., Yoon S.C., Ratner B.D. Surf. Interface Anal. 10:1987;384.
10. Niehuis E., van Velzen P.N.T., Lub J., Heller T., Benninghoven A. Surf. Interface Anal. 14:1989;135.
11. Hearn M.J., Briggs D. Vacuum. 36:1986;1005.
12. Milosěv I., Strehblow H.-H., Navinsěk B., Metikoš-Huković M. Surf. Interface Anal. 23:1995;529.
13. Vasile M.J., Emerson A.B., Baiocchi F.A. J. Vac. Sci. Technol. A8:1990;99.
14. M.P. Seah, in: D. Briggs, M.P. Seah (Eds.), Practical Surface Analysis, 2nd Edition, Vol. 1, Wiley, Chichester, 1990, p. 235.
15. Strydom I.R., Hofmann S. J. Electron Spectrosc. Relat. Phenom. 56:1991;85.
16. Bertóti I., Mohai M., Sullivan J.L., Saied S.O. Surf. Interface Anal. 21:1994;467.
17. Nefedov V.I. J. Electron Spectrosc. Relat. Phenom. 25:1982;29.
18. Madey T.E., Wagner C.D., Joshi A. J. Electron Spectrosc. Relat. Phenom. 10:1977;359.
19. Donnelly V.M., Gross M.E. J. Vac. Sci. Technol. A11:1993;66.
20. Nitta T., Hanabusa M. Appl. Phys. Lett. 69:1996;340.
21. Taylor J.A. Appl. Surf. Sci. 7:1981;168.