Magnification factor should be 8x for the 45nm node

Microlithography World

Volumn 13, Issue 4, 2004, Pages

  Takehisa, Kiwamu ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LENSES; MASKS; MICROPROCESSOR CHIPS; PROJECTION SYSTEMS;

MAGNIFICATION FACTOR; MULTIMASK SCANNER; PROJECTION LENSES; PROJECTION OPTICS;

PHOTOLITHOGRAPHY;

EID: 10044228419     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (11)

1. K. Nakano, H. Nagasaka, S. Owa, "Immersion Lithography," Proc. NGL Workshop, Japan Applied Physics Society, June 2004.
2. S. Hector, "Mask Magnification at the 45-nm Node and Beyond," International Sematech Litho Forum, Jan. 2004.
3. F. Abboud, K.-H. Baik, V. Chakarian, D. Cole, J. Daniel, et al., " 100nm OPC Mask Patterning Using Raster-Scan, 50kV Pattern Generation Technology," Proc. SPIE, Vol. 4562, pp. 1-8, 2002.
4. W. Trybula, "A Common Base for Mask COO," Proc. SPIE, Vol. 5256, pp. 318-323, 2003.
5. P.J. Silverman, "Who Can Afford Advanced Lithography," Microlithography World, Vol. 12, No. 4, pp. 8-12, Nov. 2003.
6. D. Anberg, "Better/Faster/Smaller: Effident Lithography," FSI International 9th Annual Lithography Breakfast Forum, July 2002.
7. H.J. Levinson, P.W. Ackmann, M.E. Preil, B. Rericha, "The Factors which Determine the Optimum Reduction Factor for Wafer Steppers," Proc. SPIE, Vol. 3677, pp. 468-478, 1999.
8. L.C. Litt, M. Kling, T. Perkinson, "Cost Analysis of 4x and 6× 9-inch Reticles for Future Lithography," Proc. SPIE, Vol. 3873, pp. 243-254, 1999.
9. K. Kotoku, K. Mikami, R. Ebinuma, Y. Yamada, Y. Zhang, "Analysis of Reticle Requirement, Reduction Factor and MEEF of Future Optical Lithography," Proc. SPIE, Vol. 4066, pp. 56-65, 2000.
10. G. Shelden, "Is It Time to Change Mask Magnification?" Proc. SPIE Vol. 4186, pp. 762-766, 2001.
11. U. Ljungblad, T. Sandstrom, H. Buhre, P. Durr, H. Lakner, "New Architecture for Laser Pattern Generations for 130nm and Beyond," Proc. of SPIE, Vol. 4186, pp. 16-21, 2001.