Analysis of reticle deformation, reduction ratio and MEEF of future optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 56-65

  Kotoku, Kenichi ^a   Mikami, Koji ^a   Ebinuma, Ryuichi ^a   Yamada, Yuichi ^a   Zhang, Yuan ^a  

^a CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MASKS; OPTICS; SEMICONDUCTOR DEVICES;

COST OF OWNERSHIP; MASK ERROR ENHANCEMENT FACTOR; OPTICAL LITHOGRAPHY; REDUCTION RATIO; RETICLE DEFORMATION;

PHOTOLITHOGRAPHY;

EID: 0033671203     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392069     Document Type: Conference Paper

References (2)